Film Stress Tencor FLX-2320

Measures the changes in the radius of curvature of a substrate created by deposition of a stressed thin film on its surface
Measures elastic constant and thermal expansion coefficient of a thin film if the thickness of the film and the substrate are known
Substrate size: 3 8 round
Operating Temp: room 500C
Substrate surface must be able to reflect a laser beam
3-d mapping options
Automated stress calculation
Laser: 4-mW GaAlAs laser with wavelength 670nm and 4-mW GaAlAs laser with wavelength 780nm

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