LPCVD
- CTR LTO Low Pressure Chemical Vapor Deposition (LPVCD) of Silicon Dioxide or Phospho-Silicate Glass.
- CTR Poly Low Pressure Chemical Vapor Deposition (LPVCD) of Undoped or Phosphorous-Doped Polysilicon or Amorphous Silicon
- CTR Nitride Low Pressure Chemical Vapor Deposition (LPVCD) of Stoichiometric and Low Stress Silicon Nitride
- CTR TEOS Low Pressure Chemical Vapor Deposition (LPVCD) of Silicon Dioxide from TEOS source.
Atmospheric
- ProTemp Doped Ox Wet or Dry Oxidation with Trans-LC for substrates with doped films.