Oxford Plasmalab 80

Status Up

  • One controller for both RIE and PECVD
  • PECVD Capabilities
    • Amorphous Si
    • Si3N4
    • SiONx
    • SiO2
  • PECVD Source Gases Available
    • SiH4, N2, N2O, NH3, Ar

Process Information

Oxford 80+ Characterization Results Summer 2010 Etch Rates and Process Parameters

 

S/N: 9M69591A

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